Abstract
The physical bases of surface chemical analysis techniques are described in the context of semiconductor analysis. Particular emphasis is placed on the SIMS (secondary ion mass spectrometry) technique, as this is one of the more useful tools for routine semiconductor characterization. The practical application of these methods is addressed in preference to describing the frontiers of current research.
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Abbreviations
- AES:
-
Auger electron spectroscopy
- DSIMS:
-
dynamic secondary ion mass spectrometry
- DWDM:
-
dense wavelength-division multiplexing
- GDMS:
-
glow discharge mass spectrometry
- GDOES:
-
glow discharge optical emission spectroscopy
- SIMS:
-
secondary ion mass spectrometry
- SSIMS:
-
static secondary ion mass spectrometry
- ToFSIMS:
-
time of flight SIMS
- XPS:
-
X-ray photon spectroscopy
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© 2006 Springer-Verlag
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Sykes, D. (2006). Surface Chemical Analysis. In: Kasap, S., Capper, P. (eds) Springer Handbook of Electronic and Photonic Materials. Springer Handbooks. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-29185-7_18
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DOI: https://doi.org/10.1007/978-0-387-29185-7_18
Publisher Name: Springer, Boston, MA
Print ISBN: 978-0-387-26059-4
Online ISBN: 978-0-387-29185-7
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