Imaging pattern formation: Bridging the pressure gap H. H. RotermundG. HaasG. Ertl OriginalPaper Pages: 569 - 574
Transient optical properties of excimer-laser-irradiated polyimide Z. BallB. HoppR. Sauerbrey OriginalPaper Pages: 575 - 578
Dopant activation in Sb-implanted relaxed Si1−xGex alloy layers grown on compositionally graded buffers C. O'RaifeartaighA. Nylandsted LarsenP. L. F. Hemment OriginalPaper Pages: 579 - 585
The effect of CO adsorption on the resistivity of thin Pd films M. RauhB. HepingP. Wissmann OriginalPaper Pages: 587 - 590
Structural changes during Ar-ion irradiation of laser-deposited Fe/Ag multilayers H. U. KrebsY. LuoW. Bolse OriginalPaper Pages: 591 - 594
Theory of particle-induced kinetic electron emission from simple metals: Comparative studies of different excitation and scattering mechanisms for Al, Mg, and Be M. Rösler OriginalPaper Pages: 595 - 607
Confining surface state electrons in less than two dimensions: A spectroscopic study J. M. GarciaO. SanchezR. Miranda OriginalPaper Pages: 609 - 613
Homogeneity and critical current density of Sn-doped PbMo6S8 superconductors P. SelvamJ. CorsE. W. Seibt OriginalPaper Pages: 615 - 621
Characterization of amorphous silicon films by contactless transient photoconductivity measurements C. SwiatkowskiM. Kunst OriginalPaper Pages: 623 - 629
Angle-resolved ultraviolet photoelectron spectroscopy of expitaxial films of vanadyl-phthalocyanine grown on alkali halides T. KawaguchiH. TadaA. Koma OriginalPaper Pages: 631 - 635
Origin of the defect states at ZnS/Si interfaces P. HazdraD. J. ReeveD. Sands OriginalPaper Pages: 637 - 641
Electronic properties of silicon-nitride films deposited by low-energy ion-beam bombardment Zhong-Min RenFang LuFu-Ming Li OriginalPaper Pages: 643 - 644
Cathodoluminescence microscopic studies of α-HgI2 platelets and crystals U. PalJ. PiquerasE. Diéguez OriginalPaper Pages: 645 - 649
Self-trapping of weak optical beams in photorefractive materials Z. M. ShengY. CuiY. Wei OriginalPaper Pages: 651 - 654
Projection-patterned etching of silicon in chlorine atmosphere with a KrF excimer laser F. FoulonM. Green OriginalPaper Pages: 655 - 661