Abstract
Analytical electron (SEM-EDX) and confocal laser scanning microscopy (CLSM), microhardness testing, determining the contact angle of wetting, and other means are used to study the mechanism behind changes in the structural state of surfaces, and the mechanical, physicochemical, and technological properties of semiconductor ore minerals (sulfides) and natural quartz under conditions of a pulsed dielectric barrier discharge at atmospheric pressure in air. Due to the action of the products of low-temperature plasma and other effective factors resulting from a discharge, the minerals soften (general maximum relative reduction in microhardness ~7–30%), and the morphology, roughness, contact angle of wetting of the surfaces of mineral polished sections, and the flotation activity of sulfide minerals change with respect to the duration of plasma treatment.
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Bunin, I.Z., Chanturiya, V.A., Ryazantseva, M.V. et al. Changes in the Surface Morphology, Microhardness, and Physicochemical Properties of Natural Minerals under the Influence of a Dielectric Barrier Discharge. Bull. Russ. Acad. Sci. Phys. 84, 1161–1164 (2020). https://doi.org/10.3103/S1062873820090099
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DOI: https://doi.org/10.3103/S1062873820090099