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Ionization fraction of the sputtered metal flux in a hollow cathode magnetron

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Abstract

Results from studies of the parameters of a novel type of plasma source—a hollow cathode magnetron—are presented. The magnetron operates at a gas pressure of 5–20 mTorr, the discharge power being in the range of 0.5–4 kW. At discharge powers exceeding 2 kW, a plasma flow with a density of higher than 1011 cm−3 and length of up to 30 cm forms at the magnetron output. Using a grid quartz crystal microbalance, the ionized copper flux fraction was measured as a function of the gas pressure, discharge power, and distance from the target. At gas pressures of higher than 15 mTorr, the degree of ionization at a distance of 31 cm exceeds 50%.

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References

  1. E. Klawuhn, G. C. D’Couto, K. A. Ashtiani, P. Rymer, M. A. Biberge, and K. B. Levy, J. Vac. Sci. Technol. A 18, 1546 (2000).

    Article  ADS  Google Scholar 

  2. V. Vyas and M. J. Kushner, J. Vac. Sci. Technol. A 24, 1955 (2006).

    Article  Google Scholar 

  3. L. Meng, R. Raju, R. Flauta, H. Shin, and D. N. Ruzic, J. Vac. Sci. Technol. A 28, 112 (2010).

    Article  Google Scholar 

  4. N. P. Poluektov, Yu P. Tsar’gorodsev, I. I. Usatov, A. G. Evstigneev, and I. A. Kamyschov, J. Modern Phys. 10, 1494 (2012).

    Article  Google Scholar 

  5. A. Anders, J. Phys. D 40, 2272 (2007).

    Article  ADS  Google Scholar 

  6. K. M. Green, D. B. Hayden, D. R. Juliano, and D. N. Ruzic, Rev. Sci. Instrum. 68, 4555 (1997).

    Article  ADS  Google Scholar 

  7. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).

    Google Scholar 

  8. W. Lotz, Z. Phys. 232, 101 (1970).

    Article  ADS  Google Scholar 

  9. M. W. Thompson, Philos. Mag. 15, 1 (1968).

    Google Scholar 

  10. J. Hopwood, Phys. Plasmas 5, 1624 (1998).

    Article  ADS  Google Scholar 

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Correspondence to Yu. P. Tsar’gorodtsev.

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Original Russian Text © Yu.P. Tsar’gorodtsev, N.P. Poluektov, I.I. Usatov, A.G. Evstigneev, I.A. Kamyschov, 2014, published in Fizika Plazmy, 2014, Vol. 40, No. 9, pp. 857–863.

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Tsar’gorodtsev, Y.P., Poluektov, N.P., Usatov, I.I. et al. Ionization fraction of the sputtered metal flux in a hollow cathode magnetron. Plasma Phys. Rep. 40, 754–759 (2014). https://doi.org/10.1134/S1063780X14090086

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  • DOI: https://doi.org/10.1134/S1063780X14090086

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