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Pulsed electrodeposition of microcrystalline chromium from trivalent Cr-DMF bath

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Abstract

Pulsed electrodeposition (PED) with square wave has successfully been applied to deposit microcrystalline chromium from Cr-dimethylformamide (DMF) bath. The influence of the duty cycle, on-time, off-time, frequency, and pulse peak current on thickness, current efficiency, and hardness were investigated. Based on the analysis of the microstructure, the corrosion behavior of both direct-current deposited (DCD) and pulse-current deposited (PED) chromium in 3.5% NaCl solution was studied using potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The results indicated that both pulsed electrodeposits and direct-current deposits have high charge transfer resistance R ct and very low I corr compared with mild-steel substrate.

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References

  1. Yagi S, Murase K, Hirato T, Awakura Y (2007) J Electrochem Soc 154:D304

    Article  CAS  Google Scholar 

  2. Puippe JC, Leaman F (1986) Theory and practice of pulse plating, 1st edn. American Electroplaters and Surface Finishers Society, Orland, FL, 247 pp

  3. Qui JH (2003) Mater Sci Forum 211:437

    Google Scholar 

  4. Kishi M (1986) Hyomen Gijutsu 37:159

    CAS  Google Scholar 

  5. Selvam M (1983) Met Finish 81:7

    Google Scholar 

  6. Morikawa T, Eguchi S (1986) Hyomen Gijutsu 37:341

    CAS  Google Scholar 

  7. Saiddington JC (1978) Plat Surf Finish 65:45

    CAS  Google Scholar 

  8. Eckler TA, Manty BA, McDaniel PL (1980) Plat Surf Finish 67:60

    CAS  Google Scholar 

  9. Gelchinski MH, Gal-Or L, Yahalom J (1982) J Electrochem Soc 129:2433

    Article  CAS  Google Scholar 

  10. Hirato T, Terabataka T, Watanabe E, Awakura Y (1996) Hyomen Gijutsu 47:245

    CAS  Google Scholar 

  11. El-Sharif M (1997) Trans Inst Met Finish 75:143

    Google Scholar 

  12. Devaraj G, Seshadri SK (1996) Plat Surf Finish 83(6):62

    CAS  Google Scholar 

  13. Pearson T, Dennis JK (1990) J Appl Electrochem 20:196–208

    Article  CAS  Google Scholar 

  14. Pearson T, Dennis JK (1990) Surf Coat Technol 42:69

    Article  CAS  Google Scholar 

  15. Song YB, Chin D-T (2002) Electrochim Acta 48(4):349

    Article  CAS  Google Scholar 

  16. Toth-Kadar E, Bakonyi I, Pogany L, Cziraki A (1996) Surf Coat Technol 88:57

    Article  Google Scholar 

  17. Ebrahimi F, Ahmed Z (2003) J Appl Electrochem 33:733

    Article  CAS  Google Scholar 

  18. Tato W, Landolt D (1998) J. Electrochem Soc 145:4173

    Article  CAS  Google Scholar 

  19. Elsener B, Rota A, Bohni H (1989) Mater Sci Forum 29:44

    Google Scholar 

Download references

Acknowledgements

One of the authors (Dr S. Mohan) thanks the Department of Science and Technology New Delhi for a research grant under SERC (Engineering Sciences) scheme no. SR/S3/ME/047/2005.

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Correspondence to S. Mohan.

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Saravanan, G., Mohan, S. Pulsed electrodeposition of microcrystalline chromium from trivalent Cr-DMF bath. J Appl Electrochem 39, 1393–1397 (2009). https://doi.org/10.1007/s10800-009-9816-3

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  • DOI: https://doi.org/10.1007/s10800-009-9816-3

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