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Understanding the effect of n-type and p-type doping in the channel of graphene nanoribbon transistor

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Abstract

In this paper, device performance of graphene nanoribbon field effect transistor (GNRFET) with different doping concentrations in different parts of the channel is reported. The study is performed by using atomistic simulations based on self-consistent solution of Schrodinger’s and Poisson’s equation within the non-equilibrium Green’s function formalism. The transfer and output characteristics suggest that device performance with n-type doping in the channel is better with smaller supply voltage compared to higher supply voltage. On increasing the n-type doping concentration, we obtained better on-current and output characteristics in comparison with undoped and p-type doped channel GNRFET. Further, we introduced step-doping profile in the graphene nanoribbon (GNR) channel and found that the device gives better on-current and good saturation condition when compared to undoped or uniformly-doped channel.

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Authors and Affiliations

  1. School of VLSI Design and Embedded Systems, NIT Kurukshetra, Kurukshetra, 136 119, India

    SUDHANSHU CHOUDHARY & VIKRAM SINGH

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  1. SUDHANSHU CHOUDHARY
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  2. VIKRAM SINGH
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Correspondence to SUDHANSHU CHOUDHARY.

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CHOUDHARY, S., SINGH, V. Understanding the effect of n-type and p-type doping in the channel of graphene nanoribbon transistor. Bull Mater Sci 39, 1303–1309 (2016). https://doi.org/10.1007/s12034-016-1277-9

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  • DOI: https://doi.org/10.1007/s12034-016-1277-9

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