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Dual-wavelength radiation thermometry: Emissivity compensation algorithms

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Abstract

The traditional contact methods of temperature measurement for metal processing applications provide accuracies of ±10 K. Noncontact methods based upon emissivity compensation techniques have the potential for improved accuracy with greater ease of use but require prior knowledge of the target emissivity behavior. The features of the basie spectral and ratio methods and five dualwavelength methods are reviewed. Experiments were conducted on a series of aluminum alloys with different surface treatments characterized by x-ray photoelectron spectroscopy in the temperature range 600 to 750 K. Compensation algorithms that account for surface characteristics are required to achieve improved accuracy.

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Authors and Affiliations

  1. School of Mechanical Engineering, Purdue University, 47907, West Lafayette, Indiana, USA

    B. K. Tsai, R. L. Shoemaker, D. P. DeWitt & B. A. Cowans

  2. School of Chemical Engineering, Purdue University, 47907, West Lafayette, Indiana, USA

    Z. Dardas & W. N. Delgass

  3. Lafayette Works, Aluminum Company of America, Lafayette, Indiana, USA

    G. J. Dail

Authors
  1. B. K. Tsai
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  2. R. L. Shoemaker
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  3. D. P. DeWitt
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  4. B. A. Cowans
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  5. Z. Dardas
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  6. W. N. Delgass
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  7. G. J. Dail
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Tsai, B.K., Shoemaker, R.L., DeWitt, D.P. et al. Dual-wavelength radiation thermometry: Emissivity compensation algorithms. Int J Thermophys 11, 269–281 (1990). https://doi.org/10.1007/BF00503877

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  • DOI: https://doi.org/10.1007/BF00503877

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