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Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms

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Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Part of the book series: NATO Science Series ((NAII,volume 55))

Abstract

Hyperthermal atoms are deposited upon a substrate in thin film deposition processes. Even when the atoms in the vapor phase are not intentionally accelerated to the substrate, the vapor phase atoms are attracted to the substrate surface with a potential of a few electron volts (eV) because of the interaction between the incoming atom and the substrate. Some deposition processes such as ion beam assisted deposition(IBAD), ion beam deposition (IBD), sputter deposition(S), and plasma enhanced chemical vapor deposition (PECVD)result in ions striking the substrate with energies from 10 to over 100 eV as shown in figure 1 [1].

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Authors and Affiliations

  1. Institute for Materials Science Mechanical and Aerospace Engineering The School of Engineering and Applied Science, The George Washington University, Washington, D.C., 20052, USA

    Charles M. Gilmore

  2. Surface Modification Branch Materials Science and Technology Division, Naval Research Laboratory, Washington, DC, 20375-5345, USA

    Charles M. Gilmore & James A. Sprague

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  1. Charles M. Gilmore
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  2. James A. Sprague
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  1. School of Electrochemical and Electrometallurgical Engineering, National Polytechnic Institute of Grenoble, Grenoble, France

    Yves Pauleau

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Gilmore, C.M., Sprague, J.A. (2002). Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms. In: Pauleau, Y. (eds) Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies. NATO Science Series, vol 55. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0353-7_12

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  • DOI: https://doi.org/10.1007/978-94-010-0353-7_12

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