Abstract
This chapter deals with the erosion of the sample by energetic particle bombardment. In this process, called sputtering, surface atoms are removed by collisions between the incoming particles and the atoms in the near-surface layers of a solid. Sputtering provides the basis for composition depth profiling with surface analysis techniques, either by analysis of the remaining surface with electron spectroscopies or by analysis of the sputtered material. Here we describe the most widely used of these latter techniques, secondary ion mass spectroscopy (SIMS).
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(2007). Sputter Depth Profiles and Secondary Ion Mass Spectroscopy. In: Fundamentals of Nanoscale Film Analysis. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-29261-8_4
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DOI: https://doi.org/10.1007/978-0-387-29261-8_4
Publisher Name: Springer, Boston, MA
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