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Microsystem CAD: From FEM to System Simulation

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Simulation of Semiconductor Processes and Devices 1998

Abstract

Microsystem technology is a highly interdisciplinary area. Therefore, a combination of different CAD methods and tools is necessary for supporting microsystem design. Process and device simulation are absic CAD methods but more and more higher levels of abstraction nedd to be applied in order to analyze microsystems adequately. This paper summarizes several modeling and simulation strategies for system simulation of microsystems on different levels of abstraction: generalized Kirchhiffian networks, black-box models, macromodels, the application of hardware description languages, and simulator coupling.

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Authors and Affiliations

  1. Design Automation Department EAS Dresden, Fraunhofer Institute for Integrated Circuits, Zeunerstrasse 38, D - 01069, Dresden, Germany

    Peter Schwarz

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  1. Peter Schwarz
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Editors and Affiliations

  1. IMEC vzw, Leuven, Belgium

    Kristin De Meyer  & Serge Biesemans  & 

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© 1998 Springer-Verlag/Wien

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Schwarz, P. (1998). Microsystem CAD: From FEM to System Simulation. In: De Meyer, K., Biesemans, S. (eds) Simulation of Semiconductor Processes and Devices 1998. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6827-1_37

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  • DOI: https://doi.org/10.1007/978-3-7091-6827-1_37

  • Publisher Name: Springer, Vienna

  • Print ISBN: 978-3-7091-7415-9

  • Online ISBN: 978-3-7091-6827-1

  • eBook Packages: Springer Book Archive

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