Abstract
The purpose of this chapter is to familiarize the reader with the experimental background of surface science. First, the necessity for usage of UHV is justified. Then, vacuum concepts are briefly considered before introducing UHV technology. Finally, the main experimental techniques for the preparation of atomically clean surfaces and the deposition of materials are discussed.
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References
Further Reading
S. Dushman: Scientific Foundations of Vacuum Technique, 2nd edn. (John Wiley, New York 1962)
N. Harris: Modern Vacuum Practice (McGraw-Hill, New York 1989)
J.F. O’Hanlon: A Users Guide to Vacuum Technology, 2nd edn. (John Wiley, New York 1990)
J.M. Lafferty (Ed): Foundations of Vacuum Science & Technology (Wiley-Interscience, New York 1998)
H. Lüth: Surfaces and Interfaces of Solid Materials, 3rd edn. (Springer, Berlin, Heidelberg 1995) Panel 1 and Chapter 2
A. Roth: Vacuum Technology, 2nd edn. (North Holland, Amsterdam 1982)
References
W. Kern, D.A. Puotinen: Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology. RCA Rev. 31, 187 (1970)
J. Margrave (Ed.): The Characterization of High Temperature Vapours. (John Wiley, New York 1967)
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© 2003 Springer-Verlag Berlin Heidelberg
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Oura, K., Katayama, M., Zotov, A.V., Lifshits, V.G., Saranin, A.A. (2003). Experimental Background. In: Surface Science. Advanced Texts in Physics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-05179-5_3
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DOI: https://doi.org/10.1007/978-3-662-05179-5_3
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-05606-2
Online ISBN: 978-3-662-05179-5
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