Abstract
While photochemistry in gases, liquids and solids has a long and well-documented record [3.1], and photochemistry, including photoelectrochemistry, at semiconductor-adsorbate interfaces is well known [3.2], photochemistry at adsorbate-metal interfaces is a newly emerging and rapidly expanding area of surface chemistry. There are also a number of recent interesting experiments involving photochemistry of molecules adsorbed at insulator surfaces [3.3]. In this paper we focus on bond cleavage within the first monolayer of adsorbate rather than on adsorbate-metal bond cleavage or photochemistry in multilayers. The latter topic has been the subject of a number of investigations and reviews [3.4–6], Table 3.1 lists a number of recent successful photochemical intraadsorbate bond cleavage experiments [3.7–27]. An interesting comparison is given in Table 3.2, which lists experiments where no photochemistry was observed [3.28–31].
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White, J.M. (1990). Photochemistry at Adsorbate-Metal Interfaces: Intra-adsorbate Bond Breaking. In: Vanselow, R., Howe, R. (eds) Chemistry and Physics of Solid Surfaces VIII. Springer Series in Surface Sciences, vol 22. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-75762-4_3
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DOI: https://doi.org/10.1007/978-3-642-75762-4_3
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