Abstract
Today’s most advanced semiconductor memory, a 4 Mbit DRAM (Dynamic Random Access Memory) [1] uses about 1013 silicon atoms for a 1 bit cell (which includes the silicon in the passive region). As shown in Fig.1, by extrapolating the number with the current slope, 1 Gbit DRAM in 1998 will need 1011–1012 atoms/bit. It is frequently said that 1 Gbit memory is the last device based on the conventional IC architecture from the viewpoint of microfabrication technology and transistor operation principle. On the other hand, according to the recently proposed concept of molecular devices, molecular memory or sometimes bio-memory, the number of atoms (mainly C, H, O, N) per 1 bit is of the order of 103 atoms/bit [2]. However, I believe there is no reason to obey the assumption that, at the beginning of the 21st century, we must give up semiconductor research, leaving seven orders of magnitude difference of atoms/bit. 50 or 100-year research with innovated concepts is definitely necessary to reach a 103 atoms/bit memory, either extrapolating the trend so far or with a somewhat slower trend. It means that the 21st century will still be a semiconductor research age.
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M. Takada, T. Takeshima, M. Sakamoto, T. Shimizu, H. Abiko, K. Katoh, M. Kikuchi, S. Takahashi, Y. Sato, Y. Inoue: ISSCC Digest of Technical Papers, p. 270 (February 1986)
T. Kamiya (ed.): Investigation Reports on Molecular Devices ( Research and Development Association for Future Electron Devices, Tokyo 1985 ) [in Japanese]
T. Suntola: Extended Abstract of the 16th (1984 International) Conference on Solid State Devices and Materials, Kobe (1984) p. 647
J. Nishizawa, H. Abe, T. Kurabayashi: J. Electrochem. Soc. 132, 1197 (1985)
A. Usui, H. Sunakawa: Jpn. J. Appl. Phys. 25, 28 (1986)
A.N. Broers, W.W. Molzen, J.J. Cuomo, N.D. Wittels: Appl. Phys. Lett. 29, 596 (1976)
S. Matsui, K. Mori: J. Vac. Sci. Technol. B4(1), 299 (1986)
K. Kuroda, S. Hosoki, T. Komoda. J. Electron. Microsc. 34, 179 (1985)
R. Dingle, H. Stornier, A.C. Gossard, W. Wiegmann: Appl. Phys. Lett. 33, 665 (1978)
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© 1986 Springer-Verlag Berlin Heidelberg
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Watanabe, H. (1986). Atomically Controlled Growth in 2, 1 and OD, and Applications. In: Kelly, M.J., Weisbuch, C. (eds) The Physics and Fabrication of Microstructures and Microdevices. Springer Proceedings in Physics, vol 13. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71446-7_13
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DOI: https://doi.org/10.1007/978-3-642-71446-7_13
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