Abstract
Achieving topography and chemistry control at the nanoscale of polymer surfaces constitutes a highly challenging objective in nanotechnology. Advances in this field suppose the development of characterization methodology with sub-100-nm resolution. Many imaging techniques based on scanning probe microscopy (SPM) were recently developed to achieve this goal [1]. Among them, pulsed force mode (PFM) atomic force microscopy (AFM), which has been proposed firstly by Marti [2], is still a method of interest since this nonresonant mode designed to allow approach curves being recorded along the scanning path provides the topography of the sample and a direct and simple local characterization of adhesion and stiffness.This chapter is aimed at demonstrating the interest of this technique to investigate polymer surfaces patterned with photochemical methods. Both topography and chemical contrast at the sub-100-nm scale can be probed, which gives new insights into photoinduced processes at the nanoscale.After an introduction focusing on the main techniques used for the analysis of the chemical contrast at micro- and nanopatterned polymer surfaces, the first part will deal with the utility of AFM in the investigation of photopolymer surfaces.In the second part, the principle of PFM and its interest in polymer surface analysis will be detailed.The third part will focus on a recent application dealing with the nanopatterning of plasma polymer surfaces using DUV photolithography techniques. Analysis of interactions between the AFM tip and the polymer surface allows acquiring relevant information on the light-induced modifications at the nanoscale.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
B. Bhushan, Measurement techniques and applications, in Handbook of Micro/Nano Tribology, ed. by B. Bhushan (CRC Press, London, 1999), p. 49
A. Rosa-Zeiser, E. Weilandt, S. Hild, O. Marti, Meas. Sci. Technol. 8, 1333–1338 (1997)
E. Selli, I.R. Bellobono, Photopolymerization of multifunctional monomers: Kinetic aspects, in Radiation Curing in Polymer Science and Technology, Polymerisation Mechanisms, Vol. III, ed. by J.P. Fouassier, J.F. Rabek, (Elsevier, London, 1993), p. 1–32
C. Decker, New developments in UV-curable acrylic monomers, in Radiation Curing in Polymer Science and Technology, Polymerisation Mechanisms, Vol. III, ed. by J.P. Fouassier, J.F. Rabek, (Elsevier, London, 1993), pp. 33–64
D.J. Lougnot, Photopolymers and holography, in Radiation Curing in Polymer Science and Technology, Polymerisation Mechanisms, Vol. III, ed. by J.P. Fouassier, J.F. Rabek, (Elsevier, London, 1993), pp. 65–100
F. Guattari, G. Maire, K. Contreras, C. Arnaud, G. Pauliat, G. Roosen, S. Jradi, C. Carré, Opt. Express 15, 2234–2243 (2007)
C. Carré, P. Saint-Georges, C. Lenaerts, Y. Renotte, Synth. Met. 127(1–3), 291–294 (2002)
C. Croutxé-Barghorn, O. Soppera, D.J. Lougnot, Appl. Surf. Sci. 168, 89–91 (2000)
H. Ibn El Ahrach, R. Bachelot, A. Vial, A.-S. Grimault, G. Lérondel, J. Plain, P. Royer, O. Soppera, Phys. Rev. Lett. 98, 107402(1–4) (2007)
Y. Martin, H.K. Wickramasinghe, Appl. Phys. Lett. 64(19), 2498–2500 (1994)
N.A. Burnham, R.J. Colton, H.M. Pollock, Nanotechnology 4, 64–80 (1993)
J.P. Aime, Z. Elkaakour, C. Odin, T. Bouhacina, D. Michel, J. Curely, A. Dautant, J. Appl. Phys. 77, 754–762 (1994)
O.K.C. Tsui, X.P. Wang, J.Y.L. Ho, X. Xiao, Macromolecules 33, 4198–4204 (2000)
X.P. Wang, X. Xiao, O.K.C. Tsui, Macromolecules 34(12), 4180–4185 (2001)
B. Cappella, S.K. Kaliappan, H. Sturm, Macromolecules 38, 1874–1881 (2005)
P.J. Eaton, P. Graham, J.R. Smith, J.D. Smart, T.G. Nevell, J. Tsibouklis, Langmuir 16(21), 7887–7890 (2000)
K.G. Yager, C.J. Barrett, Macromolecules 39(26), 9320–9326 (2006)
M. Csete, N. Kresz, C. Vass, G. Kurdi, Z. Heiner, M. Deli, Z. Bor, O. Marti, Mat. Sci. Eng. C 25, 813–819 (2005)
M. Csete, J. Kokavecz, Z. Bor, O. Marti, Mat. Sci. Eng. C 23, 939–944 (2003)
O. Soppera, M. Feuillade, C. Croutxé-Barghorn, C. Carré, Prog. Solid State Chem. 34(2–4), 87–94 (2006)
C.A. Rezende, L.-T. Lee, F. Galembeck, Langmuir 25(17), 9938–9946 (2009)
C. Zhao, M. Burchardt, T. Brinkhoff, C. Beardsley, M. Simon, G. Wittstock, Langmuir 26(11), 8641–8647 (2010)
K. Deng, M.A. Winnik, N. Yan, Z. Jiang, P.V. Yaneff, R.A. Ryntz, Polymer 50, 3225–3233 (2009)
C.T. Gibson, G.S. Watson, S. Myhra, Scanning 19, 564 (1997)
F. Iwata, T. Matsumoto, A. Sasaki, Nanotechnology 11, 10 (2000)
Y. Defosse, C. Carré, D.J. Lougnot, Pure Appl. Opt. 2, 437–440 (1993)
C. Carré, P. Saint-Georges, G. Pauliat, Proc. SPIE 5464, 345–350 (2004)
S. Jradi, C. Croutxé-Barghorn, C. Carré, Proc. SPIE 5827, 410–417 (2005)
O. Soppera, S. Jradi, D.J. Lougnot, J. Polym. Sci. Part A: Polym. Chem. 46(11), 3783–3794 (2008)
O. Soppera, S. Jradi, C. Ecoffet, D.J. Lougnot, Nanoengineering: Fabrication, properties, optics and devices IV, Proc. SPIE 6647, 6647OI (2007)
C. Deeb, C. Ecoffet, R. Bachelot, J. Plain, A. Bouhelier, O. Soppera, J. Am. Chem. Soc. 133(27), 10535–10542 (2011)
C. Deeb, R. Bachelot, J. Plain, A.L. Baudrion, S. Jradi, A. Bouhelier, O. Soppera, P.K. Jain, L.B. Huang, C. Ecoffet, L. Balan, P. Royer, ACS Nano 4(8), 4579–4586 (2010)
S. Jradi, O. Soppera, D.J. Lougnot, J. Microscopy 229(1), 151–161 (2008)
J.E. Dietz, N.A. Peppas, Polymer 38(15), 3767–3781 (1997)
R.L. Bowen, J. Am. Dent. Assoc. 66, 57–64 (1963)
M. Braem, P. Lambrechts, G. Vanherle, C.L. Davidson, J. Dent. Res. 66, 1713–1716 (1987)
B.S. Dauvillier, A.J. Feilzer, A.J. De Gee, C.L. Davidson, J. Dent. Res. 79, 818–823 (2000)
H.V. Boening, Fundamental of Plasma Chemistry and Technology, (Technomic Publishing Company, Inc., Lancaster, 1988), p. 75; H. Yasuda, Plasma Polymerization, (Academic, London, 1985)
V. Roucoules, A. Ponche, F. Siffer, U. Ergurrolla, M.F. Vallat, J. Adhes. 83, 875–895 (2007)
D.O.H. Teare, C. Spanos, P. Ridley, E.J. Kinmond, V. Roucoules, J.P.S. Badyal, Chem. Mater. 14, 4566–4571 (2002)
H. Yasuda, Y. Matsuzawa, Plasma Process. Polym. 2, 507–512 (2005)
O. Soppera, A. Dirani, A. Ponche, V. Roucoules, Nanotechnology 19, 395304–395312 (2008)
A. Geissler, M.F. Vallat, L. Vidal, J.C. Voegel, J. Hemmerlé, P. Schaaf, V. Roucoules, Langmuir 24, 4874–4880 (2008)
A.L. Weisenhorn, P.K. Hansma, T.R. Albrecht, C.F. Quate, Appl. Phys. Lett. 54(26), 2651–2653 (1989)
S. Sakrani, L.Q. Jie, Y.J. Wahab, Fund. Sci. 1(1), 23–33 (2005)
M. Paajanen, J. Katainen, O.H. Pakarimen, A.S. Foster, J.J. Lahtinen, Coll. Int. Sci. 304, 518–523 (2006)
S. Biggs, P.J. Mulvaney, Chem. Phys. 100(11), 8501–8505 (1994)
T. Eastman, D.M. Zhu, Langmuir 12, 2859–2862 (1996)
Y.I. Rabinovich, M.S. Esayanur, B.M. Moudgil, Langmuir 21, 10992–10997 (2005)
D.A. Grigg, P.E. Russell, Vac. Sci. Technol. A 10(4), 680–683 (1992)
A. Noy, D.V. Vezenov, C.M. Lieber, Annu. Rev. Mater. Sci. 27, 381–421 (1997)
Z. Xiong, G.D. Peng, B. Wu, P.L. Chu, J. Lightwave Technol. 17(11) 2361 (1999)
A. Dirani, F. Wieder, V. Roucoules, A. Airoudj, O. Soppera, Plasma Process. Polym. 7, 571–581 (2010)
F. Siffer, A. Ponche, P. Fioux, J. Schultz, V. Roucoules, Anal. Chim. Acta. 539, 289–299 (2005)
K. Mougin, H. Haidara, Europhys. Lett. 61(5), 660–666 (2003)
O. Soppera, S. Jradi, D.J. Lougnot, in AdvancedTechniquesand Applications on Scanning Probe Microscopy, ed. by J.-L. Bubendorff, F. Lei, (2008), pp. 119–140, Applied Physics Review Books, Research Signpost, ISBN 9788178953786
A. Dirani, V. Roucoules, H. Haidara, O. Soppera, Langmuir 26, 17532–17539 (2010)
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2012 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Soppera, O., Dirani, A., Jradi, S., Roucoules, V., Haidara, H. (2012). Investigation of Nanopatterned Functional Polymer Surfaces by AFM in Pulsed Force Mode. In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology 3. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-25414-7_11
Download citation
DOI: https://doi.org/10.1007/978-3-642-25414-7_11
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-25413-0
Online ISBN: 978-3-642-25414-7
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)