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Vacuum Evaporation

  • Chapter
Handbook of Thin-Film Technology

Abstract

PVD (physical vacuum deposition) methods are the following: [1]: Vacuum evaporation, Ion plating, Cathodic sputtering. These three techniques are also used in reactive processes for coatings with chemical compounds, as well as molecular beam epitaxy [1–5], which is a variant of vacuum evaporation. With ion implantation [6–10], one can change the properties of solid surfaces without coatings. This is not a coating process.

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Authors
  1. Hartmut Frey Prof. Dr.
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Editors and Affiliations

  1. Esslingen, Germany

    Hartmut Frey Prof. Dr.

  2. Schwäbisch Gmünd, Germany

    Hamid R. Khan Prof. Dr.

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Frey, H. (2015). Vacuum Evaporation. In: Frey, H., Khan, H.R. (eds) Handbook of Thin-Film Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-05430-3_3

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