Abstract
Vacuum coating processes are characterized by a number of advantages. These include variability of the coating materials, reproducibility of the film properties, and adjustment of the film properties by changing the coating parameters, and the great purity of the coatings. Despite the influence of residual gases in the recipient, and that of the coating material and the condensation rate, the entrapping residual gas molecules into the film can be kept arbitrarily small, if only the residual gas pressure in the recipient is kept accordingly low. Therefore, the conception of the vacuum system during the design and technical execution of vacuum coating plants for Physical Vapor Deposition (PVD) procedures is especially important.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Similar content being viewed by others
References
Einführung in die Hoch- und Ultrahochvakuumerzeugung. (PDF-Datei; 864 kB) Pfeiffer Vacuum, September 2003
Wutz M, Adam H, Walcher W (1988) Theorie und Praxis der Vakuumtechnik. Vieweg, Braunschweig, Wiesbaden
Wuest W (2002) In: Profos P (ed) Handbuch der industriellen Messtechnik. Oldenbourg,
Tsutsumi Y, Ueda S, Ikewaga M, Kobyashi J (1990) Prevention of oil vapor backstreaming in vacuum systems by gas purge method. J Vac Sci Tech A 8(3):2764–2767
Wycliffe H (1987) Mechanical big vacuum pumps with an oil-free swept volume. J Vac Technol A 5(4):2608–2611
Troup AP, Dennis NT (1991) Six years of dry pumping: A review of experience and issues. J Vac Technol A 9(3):2408–2052
Kienel G, Frey H (1977) Betriebsverhalten einer Refrigerator-Kryopumpe an einer Aufdampfanlage. Vakuum-Technik 26(2):
Baechler WG (1989) Cryopumps for research and industr. Vacuum 37(1/2):21–29
Haefer RA (1981) Praktische Ausführung von Kryopumpen. Springer-Verlag, , pp 147–217
Frey H, Haefer RA, Eder FX (eds) (1981) Tieftemperaturtechnologie. VDI-Verlag, , pp 301–310
Edelmann C (1998) Vakuumphysik: Grundlagen, Vakuumerzeugung und -messung. Spektrum Akademischer Verlag, Heidelberg
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2015 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Frey, H. (2015). Relevance of the Vacuum Technology for Thin Film Coatings. In: Frey, H., Khan, H.R. (eds) Handbook of Thin-Film Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-05430-3_2
Download citation
DOI: https://doi.org/10.1007/978-3-642-05430-3_2
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-05429-7
Online ISBN: 978-3-642-05430-3
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)