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Effect of Thermal Evaporation Conditions on Structure and Structural Changes in Amorphous Arsenic Sulfides

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Metastable States in Amorphous Chalcogenide Semiconductors

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 128))

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Abstract

In this first chapter we consider, using a powerful technique such as Raman scattering, structural changes induced by light and heat treatment in vacuum-deposited amorphous chalcogenide films prepared by thermal evaporation at different rates. The changes in the Raman spectra of thermally evaporated amorphous As2S3 films after light treatment are interpreted in terms of rearrangement of bonding configurations of molecular species that exist just after evaporation. As the evaporation temperature or deposition rate is increased, irradiation with bandgap light, As-enriching and/or further annealing of the films induces the formation of microcrystallites. At the same time, the reversible photoinduced changes in annealed films involve negligibly small changes in bonding statistics. Discernable change occurs in the medium-range order.

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Correspondence to Victor I. Mikla .

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Mikla, V.I., Mikla, V.V. (2010). Effect of Thermal Evaporation Conditions on Structure and Structural Changes in Amorphous Arsenic Sulfides. In: Metastable States in Amorphous Chalcogenide Semiconductors. Springer Series in Materials Science, vol 128. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-02745-1_2

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