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Generation and Propagation of Defects During Crystal Growth

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Springer Handbook of Crystal Growth

Part of the book series: Springer Handbooks ((SHB))

Abstract

This chapter presents a review of the typical growth defects of crystals fully grown on (planar) habit faces, i.e., of crystals grown in all kinds of solutions, in supercooled melt (mainly low-melting organics) and in the vapor phase. To a smaller extent growth on rounded faces from the melt is also considered when this seems appropriate to bring out analogies or discuss results in a more general context. The origins and typical configurations of defects developing during growth and after growth are illustrated by a series of selected x-ray diffraction topographs (Lang technique) and, in a few cases, by optical photographs.

After an overview (Sect. 4.1) the review starts with the formation of inclusions (Sect. 4.2), which are the main origin of other growth defects such as dislocations and twins. Three kinds of inclusions are treated: foreign particles, liquid inclusions (of nutrient solution), and solute precipitates. Particular attention is directed to the regeneration of seed crystals into a fully facetted shape (capping), and inclusion formation due to improper hydrodynamics in the solution, especially for potassium dihydrogen phosphate (KDP).

Section 4.3 deals briefly with striations (treated in more detail in Chap. 6 of this Handbook) and more comprehensively with the different kinds of crystal regions grown on different growth faces: growth sectors, vicinal sectors, and facet sectors. These regions are usually differently perfect and possess more or less different physical properties, and the boundaries between them are frequently faulted internal surfaces of the crystal. Two subsections treat the optical anomalies of growth and vicinal sectors and the determination of the relative growth rates of neighboring growth faces from the orientation of their common sector boundary.

In Sect. 4.4 distinction is made between dislocations connected to and propagating with the growth interface (growth dislocations), and dislocations generated behind the growth front by plastic glide due to stress relaxation. The main sources of both types of dislocations are inclusions. In crystals grown on planar faces, growth dislocations are usually straight-lined and follow (frequently noncrystallographic) preferred directions depending on the Burgers vector, the growth direction, and the elastic constants of the crystal. These directions are explained by a minimum of the dislocation line energy per growth length, or equivalently by zero force exerted by the growth surface on the dislocation. Calculations based on anisotropic linear elasticity of a continuum confirm this approach. The influence of the discrete lattice structure and core energy on dislocation directions is discussed. Further subsections deal with Burgers vector determination by preferred directions, postgrowth movement of grown-in dislocations, generation of postgrowth dislocations, and the growth-promoting effect of edge dislocations.

Section 4.5 presents twinning, the main characteristics of twins and their boundaries, their generation by nucleation and by inclusions, their propagation with the growth front, and their growth-promoting effect. Postgrowth formation of twins by phase transitions and ferroelastic (mechanical) switching is briefly outlined. Finally, Sect. 4.6 compares the perfection of crystals (KDP and ammonium dihydrogen phosphate (ADP)) slowly and rapidly grown from solutions. It shows that the optical and structural quality of rapidly grown crystals is not inferior to that of slowly grown crystals, if particular precautions and growth conditions are met.

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Abbreviations

ADP:

ammonium dihydrogen phosphate

BCF:

Burton–Cabrera–Frank

DKDP:

deuterated potassium dihydrogen phosphate

ELO:

epitaxial lateral overgrowth

GGG:

gadolinium gallium garnet

HRTEM:

high-resolution transmission electron microscopy

KDP:

potassium dihydrogen phosphate

MOVPE:

metalorganic vapor-phase epitaxy

PL:

photoluminescence

TEM:

transmission electron microscopy

TPRE:

twin-plane reentrant-edge effect

fcc:

face-centered cubic

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  1. Institut für Kristallographie, RWTH Aachen University, Aachen, Germany

    Helmut Klapper

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  1. Advanced Renewable Energy Company, 18 Celina Avenue, 03063, Nashua, NH, USA

    Govindhan Dhanaraj Dr.

  2. Department of Geology, University of Mysore, Manasagangotri, 570 006, Mysore, India

    Kullaiah Byrappa Ph.D.

  3. University of North Texas, 1155 Union Circle, 76203-5017, Denton, TX, USA

    Vishwanath Prasad Dr.

  4. Department of Materials Science and Engineering, Stony Brook University, 11794-2275, Stony Brook, NY, USA

    Michael Dudley Dr.

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Klapper, H. (2010). Generation and Propagation of Defects During Crystal Growth. In: Dhanaraj, G., Byrappa, K., Prasad, V., Dudley, M. (eds) Springer Handbook of Crystal Growth. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-74761-1_4

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