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Part of the book series: Microtechnology and MEMS ((MEMS))

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In this chapter, various electron scattering cross sections used in describing electron-beam transport are discussed. Properties for the elastic and inelastic scattering of electrons are provided. Elastic scattering, where electrons do not lose energy while being deflected, is modeled using the Rutherford and Mott scattering approaches. Inelastic scattering, where electrons loose their energy, is modeled with the Bethe approach or the dielectric theory. These scattering cross-sections are used in conjunction with the procedures outlined in Chapter 3 to simulate the electron-energy deposition profile within a target workpiece.

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© 2008 Springer-Verlag Berlin Heidelberg

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(2008). Modeling of e-Beam Transport. In: Thermal Transport for Applications in Micro/Nanomachining. Microtechnology and MEMS. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-73607-3_4

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