Abstract
In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.
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Koch, S., Ponikvar, M., Steinberger, M., Horn, M. (2017). Model Predictive Temperature Control of a Distribution System for Chemicals. In: Irschik, H., Belyaev, A., Krommer, M. (eds) Dynamics and Control of Advanced Structures and Machines. Springer, Cham. https://doi.org/10.1007/978-3-319-43080-5_12
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DOI: https://doi.org/10.1007/978-3-319-43080-5_12
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