Abstract
We have seen in Chaps. 3, 4, and 5 a variety of methods to make nanoparticles (including spherical and other particle shapes) and thin films (or multilayers). These methods are popularly known as bottom up approach. In bottom up approach atoms and molecules are assembled so as to have nanomaterials of required size and shape by controlled deposition or reaction parameters. In the top down approach reverse is the case. Atoms and molecules are removed from a bulk material or sometimes thin films so as to obtain desired nanostructure.
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Further Reading
C.Y. Chang, S.M. Sze, VLSI Technology (McGraw Hill, New York, 1999)
S.A. Gangal, S.K. Kulkarni. Physics Education, April–June 2002, p 1–9
W.H. Moreau, Semiconductor Lithography: Principles, Practice and Materials (Plenum Press, New York, 1985)
Y. Xia, J.A. Rogers, K.E. Paul, M.G. Whitesides, Chem. Rev. 99, 1823–1848 (1999)
X. Younan, G.M. Whitesides, Angew. Chem. Int. Ed. 37, 550–575 (1998)
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Kulkarni, S.K. (2015). Nanolithography. In: Nanotechnology: Principles and Practices. Springer, Cham. https://doi.org/10.1007/978-3-319-09171-6_9
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DOI: https://doi.org/10.1007/978-3-319-09171-6_9
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