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Gaseous, Chemical, and Other Contaminant Descriptions

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Contamination Control and Cleanrooms
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Abstract

Most contamination control technology considers generalized and often unidentified particulate material as the major contaminant, but there are many situations in which gases, chemical films, microbiological materials, environment physical conditions, and unusual ambient energy levels are hazardous to the well-being of the products. This variety of contaminants can degrade product quality at least as seriously as can particulate contaminants. In fact, as particle removal and control methods improve, contaminating gases and vapors become a major problem area. However, their sources can be different than the particle sources, their transport and deposition mechanisms are different, their interaction with products and their control and/or removal procedures are different, and their spatial and temporal distributions in the manufacturing and processing environment are usually different from that of particulate contamination.

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References

  • Blitshteyn, M., & Martinez, A. M., 1986. Electrostatic-Charge Generation on Wafer Surfaces and Its Effect on Particulate Deposition. Microcontamination 4(11):55–61.

    Google Scholar 

  • Burkman, D. C, et al., 1988. Understanding and Specifying the Sources and Effects of Surface Contamination in Semiconductor Processing. Microcontamination 6(11):57–62, 107, 110.

    Google Scholar 

  • Cooper, D. W., et al., 1988. Deposition of Submicron Aerosol Particles during Integrated Circuit Manufacturing: Theory. Proceedings of the 9th International Committee of Contamination Control Societies Conference, pp. 19–26, September 26, 1988, Los Angeles.

    Google Scholar 

  • Frey, A. H., 1986. Reduction of Formaldehyde, Ammonia, SO2, and CO2 Concentrations in Room Air. Journal of Environmental Science 29(4):57–59.

    Google Scholar 

  • Harper, J., & Bailey, L., 1984. Flexible Material Handling Automation in Wafer Fabrication. Solid State Technology 27(7):89–98.

    Google Scholar 

  • Librizzi, J., and Manna, R. R., 1983. Controlling Air Pollution from Semiconductor Fabrication Operations. Microelectronics Manufacturing and Testing 6(12):46–48.

    Google Scholar 

  • Liu, B. Y. H., et al., 1987. Aerosol Charging and Neutralization and Electrostatic Discharge in Clean Rooms. Journal of Environmental Science 30(2):42–46.

    Google Scholar 

  • McMahon, R., 1989. Monitoring Hazardous High-Purity Gases Used in Semiconductor Fabrication. Microelectronics Manufacturing and Testing 12(4):8–10.

    MathSciNet  Google Scholar 

  • Ohmi, T., Inaba, H., & Takenama, T., 1989. Preventing Electromagnetic Interference Essential for ULSI E-Bearn Performance. Microcontamination 7(11): 29–35.

    Google Scholar 

  • Turner, T., 1983. Static in Wafer Fabrication Facility: Causes and Solutions. Semiconductor International 6(8): 122–126.

    Google Scholar 

  • Whyte, W., 1968. Bacteriological Aspects of Air-Conditioning Plants. Journal of Hygiene 66:567.

    Article  Google Scholar 

  • Whyte, W., 1986. Sterility Assurance and Models for Assessing Airborne Bacterial Contamination. Journal of Parenteral Science and Technology 40(5): 188–197.

    Google Scholar 

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© 1992 Van Nostrand Reinhold

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Lieberman, A. (1992). Gaseous, Chemical, and Other Contaminant Descriptions. In: Contamination Control and Cleanrooms. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-6512-9_4

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  • DOI: https://doi.org/10.1007/978-1-4684-6512-9_4

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-6514-3

  • Online ISBN: 978-1-4684-6512-9

  • eBook Packages: Springer Book Archive

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