Abstract
A survey of our present knowledge about radiation damage in crystalline solids is presented. The subject matter is specially selected to facilitate comparisons between metals and semiconductors. The damage pattern produced by different kinds of irradiation and the experimental techniques available for the investigation of radiated-induced defects are described. It is emphasized that the key problems in the understanding of radiation damage in the most thoroughly investigated materials (i.e., fee metals and elemental semiconductors) center around the nature of the self-interstitials. Theoretical reasons for the complex behaviour of these defects are discussed. An interpretation for radiation damage annealing in silicon is suggested.
On scientific leave from Max-P1anck-Institut für Metallforschung, Stuttgart, and University of Stuttgart, Germany.
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Frank, W. (1973). Radiation Damage in Metals and Semiconductors. In: Crowder, B.L. (eds) Ion Implantation in Semiconductors and Other Materials. The IBM Research Symposia Series. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-2064-7_1
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DOI: https://doi.org/10.1007/978-1-4684-2064-7_1
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