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Graphene Growth by CVD Methods

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Graphene Nanoelectronics

Abstract

In this chapter, the production of graphene by chemical vapor deposition (CVD) is discussed. CVD is widely used in the microelectronics industry in processes involving the deposition of thin films of various materials. The deposition is made from precursors in the gas phase which adsorb on the target surface producing a condensed phase of a specific material. The attractiveness of the generation of graphene by CVD is based on the fact that this technique allows for scalability as well as low cost.

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Authors and Affiliations

  1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA

    Alfonso Reina & Jing Kong

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  1. Alfonso Reina
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  2. Jing Kong
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Correspondence to Alfonso Reina .

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Editors and Affiliations

  1. , Nanotechnology Research Center, Georgia Institute of Technology, Atlantic Drive NW 791, Atlanta, 30332-0269, USA

    Raghu Murali

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Reina, A., Kong, J. (2012). Graphene Growth by CVD Methods. In: Murali, R. (eds) Graphene Nanoelectronics. Springer, Boston, MA. https://doi.org/10.1007/978-1-4614-0548-1_7

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  • DOI: https://doi.org/10.1007/978-1-4614-0548-1_7

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