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mm-Wave Device Optimization

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Ultra High-Speed CMOS Circuits
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Abstract

As was mentioned in the previous chapter, device performance in mm-Wave frequencies is deeply under the influence of layout parasitics. Apart from the urge for layout dependent models, as was pointed out before, this has another important consequence: Unlike low frequency circuit design in which the device design is absolutely in the realm of process engineers, here the circuit designer could- and should- alter the device performance by changing the device layout [1, 3]. This enables the designer to layout the device based on the performance metric which is more important in any specific application. It might be astounding in the first look how much the device layout could vary certain device parameters. f max , for instance, which is an indicator of the speed of the transistor, have been reported for a similar process, CMOS 90 nm, from 80 GHz to up to 300 GHz mainly due to differences in layout [2, 8].

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Notes

  1. 1.

    A general condition for N-port unilateralization is presented in Chap. 5.

  2. 2.

    Noise analysis and optimization is discussed in Chap. 4.

References

  1. Cheon KS et al (1997) CMOS layout and bias optimization for RF IC design applications. Digest of IEEE Microwave Symposium, vol 2, pp 945–948

    MathSciNet  Google Scholar 

  2. Guo JC, Lien WY, Hung MC et al (2003) Low-K/Cu CMOS logic based SoC technology for 10 Gb transceiver with 115 GHz fT, 80 GHz fMAX RF CMOS, high-Q MiM capacitor and spiral Cu inductor. VLSI Digest of Technical Papers, pp 39–40

    Google Scholar 

  3. Heydari B, Bohsali M, Adabi E, Niknejad AM mm-Wave Devices and Circuit blocks up to 104GHz in 90nm CMOS. IEEE J. of Solid State Circuits, vol 42 pp 2893–2903

    Google Scholar 

  4. Jin X et al (1998) An effective gate resistance model for CMOS RF and noise modeling. IEDM’98 Technical Digest, pp 961–964

    Google Scholar 

  5. Mason SJ (1954) Power gain in feedback amplifiers. Trans IRE Professional Group on Circuit Theory, vol CT-1, no 2, pp 20–25

    Google Scholar 

  6. Niknejad AM (2007) Electromagnetics for high-speed analog and digital communication circuits, 1st edn. Cambridge University Press, Cambridge

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  7. Sze SM (1990) High speed semiconductor devices. Wiley, New York

    Google Scholar 

  8. Tiemeijer LF et al (2004) Record RF performance of standard 90 nm CMOS technology. IEDM Technical Digest, pp 441–444

    Google Scholar 

  9. Tsividis Y (2003) Operation and modeling of the MOS transistor, 2nd edn. Oxford University Press, Oxford

    Google Scholar 

  10. Ytterdal T, Cheng Y, Fjeldly TA (2003) Device modeling for analog and RF CMOS circuit design, 1st edn. Wiley, New York

    Book  Google Scholar 

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Correspondence to Sam Gharavi .

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Gharavi, S., Heydari, B. (2011). mm-Wave Device Optimization. In: Ultra High-Speed CMOS Circuits. Springer, New York, NY. https://doi.org/10.1007/978-1-4614-0305-0_3

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  • DOI: https://doi.org/10.1007/978-1-4614-0305-0_3

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