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Nanopattern Formation Using Dip-Pen Nanolithography

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Tip-Based Nanofabrication

Abstract

The fabrication of bottom-up nanostructures is a crucial step for the advancement of nanotechnology. Dip-pen nanolithography has started off as a method for the transfer of small organic molecules and has matured over the years to one of the most versatile patterning techniques available in the nanoscale. Three-dimensional structures made from organic or inorganic materials on a large variety of different substrates and length scales have been fabricated. This review highlights the techniques used for the fabrication of these structures together with their practical applications. Furthermore, the physical mechanisms involved in the dip-pen process are discussed by summarizing the experimental and theoretical results obtained so far.

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Abbreviations

AFM:

Atomic force microscopy

CNT:

Carbon nanotube

DNA:

Deoxyribonucleic acid

DPN:

Dip-pen nanolithography

MHA:

Mercaptohexadecanoic acid

MUA:

Mercaptoundecanoic acid

ODT:

Octadecanethiol

SAM:

Self-assembled monolayer

STM:

Scanning tunneling microscope

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Acknowledgments

This work was financed by the Austrian Ministry of Transport, Innovation, and Technology (BMVIT) and the FFG through the Nanoinitiative project PLATON (Project No. 819654).

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  1. Center for Micro- and Nanostructures, Vienna University of Technology, 1040, Vienna, Austria

    Bernhard Basnar

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  1. Dept. Mechanical &, Aerospace Engineering, Arizona State University, Tempe, Arizona, USA

    Ampere A. Tseng

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Basnar, B. (2011). Nanopattern Formation Using Dip-Pen Nanolithography. In: Tseng, A. (eds) Tip-Based Nanofabrication. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-9899-6_6

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