Abstract
The attractiveness of hot embossing lithography (HEL) also known as nanoimprint lithog-raphy (NIL) as nanofabrication technique is mainly founded on its simplicity. This lithog-raphy already apparent in the works of S. Chou, 1–3 who demonstrated that features of a few ten’s of nanometers can be imprinted with a standard laboratory press. The lithog-raphy of embossing reach back into history and are applied today in the production of numerous products, in particular a broad variety of materials is presently micro-moulded in micro-system technology. 4 Although earlier attempts to modify polymer surfaces on a nanometer scale were reported, 5–8 the work of S. Chou certainly has stimulated the interest of the nanofabrication community, since expectations were raised, that a low cost nanofabrication technique was at hand. Since then, a number of technical realisations and variations to the process have been developed, which are reviewed in considerable detail. 9 Most of them share a common principle: a pattern is transferred into a fluid layer by embossing the mould into it. Usually a thin polymer layer spun on a silicon substrate is moulded by a sequence of steps, which are schematically depicted in Figure 1.
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Hoffmann, T. (2003). Viscoelastic Properties of Polymers. In: Sotomayor Torres, C.M. (eds) Alternative Lithography. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-9204-8_3
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