Abstract
Numerous physical modeling problems in the semiconductor industry involve large scale differences. In one class of equipment modeling problems, the goal is to relate macroscopic reactor level behavior to the growth of material on features that are six orders of magnitude smaller. In another class of problems, properties calculated at the atomic level are used to construct models that apply over much larger length scales. Several examples are described from electroplating, chemical vapor deposition, deposition of metallization, reliability, and chemical-mechanical polishing.
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Borucki, L.J. (2004). Taking on the Multiscale Challenge. In: Abdallah, N.B., et al. Dispersive Transport Equations and Multiscale Models. The IMA Volumes in Mathematics and its Applications, vol 136. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-8935-2_2
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DOI: https://doi.org/10.1007/978-1-4419-8935-2_2
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