Abstract
A quick review of the deposition methods that achieved sufficient low resistivities and comparison of these methods in terms of the capability for large area mass production will be made. At the later half our experience on two pilot runs by evaporation and magnetron sputtering machines will be described in detail.
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Acknowledgement
The author would like to express sincere thanks to Dr. T. Oyama, Mr. Ishikawa, Mr. T. Haranoh, Dr. Takaki, Prof. Y. Shigesato Dr. K. Suzuki and Mr. T. Iwamatsu for supporting him on this subject.
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Mizuhashi, M. (2011). Process Technology and Industrial Processes. In: Ginley, D. (eds) Handbook of Transparent Conductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-1638-9_15
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