Abstract
In the past decades, the progresses of semiconductors are mainly powered by Moore’s law focusing on IC miniaturization down to nanoscale, resulting in the transition from microelectronics into nanoelectronics. Recently, we have witnessed the quick development of a new area of Micro/nanoelectronics beyond the boundaries of Moore’s law, called “More than Moore” (MtM). MtM creates and adds various nondigital functionalities to semiconductor products and focuses on creating high value micro/nanoelectronics systems, leading to virtually unlimited technology possibilities and application potentials. This chapter presents the changing global landscape of micro/nanoelectronics by summarizing the major ongoing technology and business development trends, especially the vision and strategy of MtM, by highlighting some potential applications, and by providing a systematic overview for the major MtM technologies.
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Acknowledgments
The authors would like to thank for the valuable contribution from our colleagues, Mart Graef, Merten Koolen, and Peter Zegers.
We are grateful to all members of the ENIAC technology domain teams, especially Livio Baldi, Eddy Blokken, Michel Brillouët, Guy Dubois, Roger de Keersmaecker, Norbert Lehner, Harald Pötter, Herbert Reichl, Lothar Schrader, Dominique Thomas, Gilles Thomas, Kees Beenakker, Peter Caldera, Alain Cappy, Walter De Raedt; and to all members of Scientific Community Council of the ENIAC, especially Patrick Dewilde, Adrian Ionescu and Hannu Tenhunen.
We would like to express our gratitude to all members of the MEDEA+ working group (“Towards and beyond 2015”), especially Hugo De Man, Thomas Gessner, Frans Widdershoven, Marc Belleville, Thomas Skotnicki, Roland Thewes, and Harry Veendrick.
Appreciations also go to colleagues active in the IEEE-CPMT society, especially Willem Chen, Bill Bottom, Rao Tummala, C.P. Wong, and Rolf Aschenbrenner.
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Zhang, G.Q., van Roosmalen, A.J. (2009). The Changing Landscape of Micro/Nanoelectronics. In: Zhang, G., Roosmalen, A. (eds) More than Moore. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-75593-9_1
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DOI: https://doi.org/10.1007/978-0-387-75593-9_1
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