Abstract
The erosion of a solid surface under high-power pulsed ion beams is considered. The values of atom yield from an irradiated surface due to the evaporation are obtained by numerical simulation. The effect of beam parameters and target characteristics on atom emission intensity was investigated. The technological capabilities of high-power submicrosecond ion beams for solid surface etching are assessed.
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Original Russian Text © O.M. Stepanova, V.P. Krivobokov, 2010, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2010, Vol. 74, No. 2, pp. 139–142.
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Stepanova, O.M., Krivobokov, V.P. Erosion of solid surface under irradiation by high-power submicrosecond ion beams. Bull. Russ. Acad. Sci. Phys. 74, 122–125 (2010). https://doi.org/10.3103/S106287381002005X
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DOI: https://doi.org/10.3103/S106287381002005X