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Accurate modeling of nanoscale gate underlap SOI MOSFET and design of low noise amplifier for RF applications

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Abstract

Paper presents an accurate model by accounting non-quasi-static and extrinsic parasitic effects for 90 nm gate underlap SOI MOSFETs for RF applications. Generated Y-parameters from the model up to 20 GHz matched very well with 2D ATLAS (with an average error of ∼5%), whereas results from quasi-static predictive technology model differ significantly (>20%). Calculated transit frequency f T and maximum frequency of oscillation f max have been found as ∼108 and ∼130 GHz respectively. Simulated noise figure at drain-to-source current I DS ≈ 0.64mA and drain-to-source voltage V DS=1 V was found to be ≈2.8 dB with gate resistance R ge = 3 Ω. A low noise amplifier (LNA) designed at operating frequency of 5.8 GHz using the model has shown good match at input (S 11 ≈ −15 dB), output (S 22 ≈ −16 dB) and gain (S 21 ≈ 15 dB). A new figure-of-merit of LNA (FoMLNA) involving signal power gain G, noise factor F and dc power consumption P dc has been proposed. By comparing with limited available measured data of 180 nm bulk, it has been found that underlap LNA (simulated using the developed model) gives almost three times improvement in the proposed FoMLNA.

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Authors and Affiliations

  1. Aligarh Muslim University, Aligarh, India

    I. V. Singh & M. S. Alam

  2. Queen’s University Belfast, Belfast, UK

    G. A. Armstrong

Authors
  1. I. V. Singh
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  2. M. S. Alam
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  3. G. A. Armstrong
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Additional information

Original Russian Text © I.V. Singh, M.S. Alam, G.A. Armstrong, 2013, published in Izv. Vyssh. Uchebn. Zaved., Radioelektron., 2013, Vol. 56, No. 6, pp. 3–18.

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Singh, I.V., Alam, M.S. & Armstrong, G.A. Accurate modeling of nanoscale gate underlap SOI MOSFET and design of low noise amplifier for RF applications. Radioelectron.Commun.Syst. 56, 265–277 (2013). https://doi.org/10.3103/S0735272713060010

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  • DOI: https://doi.org/10.3103/S0735272713060010

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