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Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water

  • Inorganic Synthesis and Industrial Inorganic Chemistry
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Abstract

The atomic layer deposition of titanium oxide in the precursor systems Ti(OCH3)4-H2O and Ti(OC2H5)4-H2O was compared. The growth rate of titanium oxide formed by the atomic layer deposition in the Ti(OCH3)4-H2O system can be adequately estimated with due to regard for the number and size of ligands of a metal-containing precursor. The study in simulated body fluid solutions showed that polycrystallin TiO2 coatings with anatase structure are prone to accelerated osseointegration and, consequently, promising for the development of new biomedical products.

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Authors and Affiliations

  1. Moscow Institute of Physics and Technology (State University), Dolgoprudnyi, Moscow oblast, Russia

    A. P. Alekhin, A. M. Markeev, D. V. Ovchinnikov, A. A. Soloviev & V. F. Toknova

Authors
  1. A. P. Alekhin
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  2. A. M. Markeev
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  3. D. V. Ovchinnikov
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  4. A. A. Soloviev
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  5. V. F. Toknova
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Corresponding author

Correspondence to V. F. Toknova.

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Original Russian Text © A.P. Alekhin, A.M. Markeev, D.V. Ovchinnikov, A.A. Soloviev, V.F. Toknova, 2013, published in Zhurnal Prikladnoi Khimii, 2013, Vol. 86, No. 3, pp. 353–359.

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Alekhin, A.P., Markeev, A.M., Ovchinnikov, D.V. et al. Atomic layer deposition of thin films of titanium dioxide from titanium tetramethoxide and water. Russ J Appl Chem 86, 326–331 (2013). https://doi.org/10.1134/S1070427213030063

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  • DOI: https://doi.org/10.1134/S1070427213030063

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