Abstract
A new method for the analysis of self-organization processes in solid-state materials by calculating the information-correlation characteristics of a surface (in particular, by calculating the average mutual information) is described. Criteria for determining the degree of ordering of a surface structure are suggested; these criteria have been tested for experimental semiconductor structures of single-, poly-crystalline, and amorphous silicon. The dependences of the information characteristics for films of disordered semiconductors on the technological conditions of their fabrication are established.
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Original Russian Text © S.P. Vikhrov, T.G. Avacheva, N.V. Bodyagin, N.V. Grishankina, A.P. Avachev, 2012, published in Fizika i Tekhnika Poluprovodnikov, 2012, Vol. 46, No. 4, pp. 433–438.
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Vikhrov, S.P., Avacheva, T.G., Bodyagin, N.V. et al. Determination of the degree of ordering of materials’ structure by calculating the information-correlation characteristics. Semiconductors 46, 415–421 (2012). https://doi.org/10.1134/S1063782612040240
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DOI: https://doi.org/10.1134/S1063782612040240