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Reply to 'Measurement of mobility in dual-gated MoS2 transistors'

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Figure 1: Hall-effect measurements on monolayer MoS2.

References

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  1. Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), Lausanne, CH-1015, Switzerland

    B. Radisavljevic & A. Kis

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  1. B. Radisavljevic
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  2. A. Kis
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Correspondence to A. Kis.

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Radisavljevic, B., Kis, A. Reply to 'Measurement of mobility in dual-gated MoS2 transistors'. Nature Nanotech 8, 147–148 (2013). https://doi.org/10.1038/nnano.2013.31

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