Abstract
Ni–P deposits with a phosphorous content of up to 20% (wt) were obtained on AA6061 substrates by direct current electrodeposition technique from a solution containing nickel sulfate, nickel chloride, phosphorous acid, phosphoric acid, and a wetting agent (sodium lauryl sulfate). The effect of various plating parameters like current density, concentration of phosphorous acid, concentration of phosphoric acid and plating temperature on the P content of the coating as well as the rate of deposition was investigated systematically. It has been observed that the influence of current density on the P content of the deposit is largely dependent on the concentration of phosphorous acid in the plating bath. Composition, surface morphology, microstructure, and mechanical properties of the Ni–P deposits were studied using SEM, EDAX, XRD, and nanoindentation techniques. Ni–P electrodeposits with low P content in the range of 4–7 wt% of P exhibited superior microhardness of 7.74–8.57 GPa. With increasing P content in the deposit, the structure undergoes transition from crystalline to nanocrystalline and becomes amorphous above 9.14 wt% of P. Ni–P alloys with some selected compositions were subjected to heat treatment at 400°C for 1 h in a hot air oven and the resulting variation in mechanical properties was studied using nanoindentation technique.
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Pillai, A.M., Rajendra, A. & Sharma, A.K. Electrodeposited nickel–phosphorous (Ni–P) alloy coating: an in-depth study of its preparation, properties, and structural transitions. J Coat Technol Res 9, 785–797 (2012). https://doi.org/10.1007/s11998-012-9411-0
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DOI: https://doi.org/10.1007/s11998-012-9411-0