Abstract
The electroless etching technique combined with the process of UV/Ozone pretreatment is presented for wafer-scale fabrication of the silicon nanowire (SiNW) arrays. The high-level uniformity of the SiNW arrays is estimated by the value below 0.2 of the relative standard deviation of the reflection spectra on the 4-in. wafer. Influence of the UV/Ozone pretreatment on the formation of SiNW arrays is investigated. It is seen that a very thin SiO2 produced by the UV/Ozone pretreatment improves the uniform nucleation of Ag nanoparticles (NPs) on the Si surface because of the effective surface passivation. Meanwhile, the SiO2 located among the adjacent Ag NPs can obstruct the assimilation growth of Ag NPs, facilitating the deposition of the uniform and dense Ag NPs catalysts, which induces the formation of the SiNW arrays with good uniformity and high filling ratio. Furthermore, the remarkable antireflective and hydrophobic properties are observed for the SiNW arrays which display great potential in self-cleaning antireflection applications.
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References
Bai F, Li MC, Song DD, Yu H, Jiang B, Li YF (2012) One-step synthesis of lightly doped porous silicon nanowires in HF/AgNO3/H2O2 solution at room temperature. J Solid State Chem 196:596–600
Chan CK, Peng H, Liu G, Mcilwrath K, Zhang XF, Huggins RA, Cui Y (2008) High-performance lithium battery anodes using silicon nanowires. Nat Nanotechnology 3(1):31–35
Dai YA, Chang HC, Lai KY, Lin CA, Chuang RJ, Lin GR, He JH (2010) Subwavelength Si nanowire arrays for self-cleaning antireflection coatings. J Mater Chem 20(48):10924–10930
Geng XW, Qi Z, Li MC, Duan BK, Zhu LJ (2012) Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts. Sol Energy Mater Sol Cells 103:98–107
He Y, Jiang CY, Yin HX, Yuan WZ (2011) Tailoring the wettability of patterned silicon surfaces with dual-scale pillars: from hydrophilicity to superhydrophobicity. Appl Surf Sci 257(17):7689–7692
Jung JY, Um HD, Jee SW, Park KT, Bang JH, Lee JH (2013) Optimal design for antireflective Si nanowire solar cells. Sol Energy Mater Sol Cells 112:84–90
Krylyuk S, Davydov AV, Levin L (2011) Tapering control of Si nanowires grown from SiCl4 at reduced pressure. ACS Nano 5(1):656–663
Mcalpine MC, Ahmad H, Wang DW, Heath JR (2007) Highly ordered nanowire arrays on plastic substrates for ultrasensitive flexible chemical sensors. Nat Materials 6(5):1–6
Morton KJ, Nieberg G, Bai SF, Chou SY (2008) Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching. Nanotechnology 19(345301):1–6
Ozdemir B, Kulakci M, Turan R, Unalan HE (2011) Effect of electroless etching parameters on the growth and reflection properties of silicon nanowires. Nanotechnology 22(15):1–7
Peng KQ, Zhang ML, Lu AJ, Wong NB, Zhang RQ, Lee ST (2007) Ordered silicon nanowire arrays via nanosphere lithography and metal-induced etching. Appl Phys Lett 90(163123):1–3
Peng KQ, Wang X, Lee ST (2009) Gas sensing properties of single crystalline porous silicon nanowires. Appl Phys Lett 95(243122):1–3
Shiu SC, Lin SB, Hung SC, Lin CF (2011) Influence of pre-surface treatment on the morphology of silicon nanowires fabricated by metal-assisted etching. Appl Surf Sci 257(6):1829–1843
Smith ZR, Smith RL, Collins SD (2013) Mechanism of nanowire formation in metal assisted chemical etching. Electrochim Acta 92:139–147
Tamboli AT, Chen CT, Warren EL, Evans DBT, Kelzenberg MD, Lewis NS, Atwater HA (2012) Wafer-scale growth of silicon microwire arrays for photovoltaic and solar fuel generation. IEEE J Photovoltaics 2(3):294–297
Wang FY, Yang QD, Xu G, Lei NY, Tsang YK, Wong NB, Ho JC (2012a) Highly active and enhanced photocatalytic silicon nanowire arrays. Nanoscale 3(8):3269–3276
Wang W, Li D, Tian M, Lee YC, Yang R (2012b) Wafer-scale fabrication of silicon nanowire arrays with controllable dimensions. Appl Sur Sci 258(22):8649–8655
Yae SJ, Nasu N, Matsumoto K, Hagihara T, Fukumuro N, Matsuda H (2007) Nucleation behavior in electroless displacement deposition of metals on silicon from hydrofluoric acid solutions. Electrochim Acta 53(1):35–42
Zazzera LZ, Moulder JF (1989) XPS and SIMS study of anhydrous HF and UV/Ozone-modified silicon(100) surfaces. J Electrochem Soc 136(2):484–491
Zhang XG (2001) Electrochemistry of silicon and its oxide. Etching of silicon, 1st edn. Kluwer Academic/Plenum, New York, pp 293–294
Acknowledgments
This study is supported by the National Natural Science Foundation of China (51172069, 50972032, 61204064, and 51202067), and the Ph.D. Programs Foundation of the Ministry of Education of China (20110036110006), and the Fundamental Research Funds for the Central Universities (Key project 11ZG02).
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Bai, F., Li, M., Huang, R. et al. Wafer-scale fabrication of uniform Si nanowire arrays using the Si wafer with UV/Ozone pretreatment. J Nanopart Res 15, 1915 (2013). https://doi.org/10.1007/s11051-013-1915-8
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DOI: https://doi.org/10.1007/s11051-013-1915-8