Abstract
Pigment-grade anatase TiO2 particles (160 nm) were passivated using ultra-thin insulating films deposited by molecular layer deposition (MLD). Trimethylaluminum (TMA) and ethylene glycol (E.G) were used as aluminum alkoxide (alucone) precursors in the temperature range of 100–160 °C. The growth rate varied from 0.5 nm/cycle at 100 °C to 0.35 nm/cycle at 160 °C. Methylene blue oxidation tests indicated that the photoactivity of pigment-grade TiO2 particles was quenched after 20 cycles of alucone MLD film, which was comparable to 70 cycles of Al2O3 film deposited by atomic layer deposition (ALD). Alucone films would decompose in the presence of water at room temperature and would form a more stable composite containing aluminum, which decreased the passivation effect on the photoactivity of TiO2 particles.
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Acknowledgments
The authors thank Dr. Peng Li (University of New Mexico) and Fredrick G. Luiszer (University of Colorado) for the TEM analysis and the ICP-AES analysis, respectively.
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Liang, X., Weimer, A.W. Photoactivity passivation of TiO2 nanoparticles using molecular layer deposited (MLD) polymer films. J Nanopart Res 12, 135–142 (2010). https://doi.org/10.1007/s11051-009-9587-0
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DOI: https://doi.org/10.1007/s11051-009-9587-0