Abstract
Lead hafnate titanate (PHT) thin film was deposited by pulse laser deposition, characterized for the usage as a ferroelectric capacitor in view of Ferroelectric Random Access Memory (FeRAM) devices, and compared with a lead zirconate titanate (PZT) reference, which was fabricated in the same conditions. Results indicate that the 126 nm-thickness PHT thin film with a low temperature self-buffer layer has a single (111)-orientation. The following electric measurements were performed to investigate the possibility of this thin film to use in the FeRAM applications by contrast to a PZT reference. This PHT sample demonstrates a good ferroelectric property with the remanent polarization of 51 μC/cm2. The remanent polarization with no obvious degradation has been observed after 2 × 109 fatigue reversals, which indicate that the PHT thin film a promising candidate in view of FeRAM applications.
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The authors would like to acknowledge the Supporting Project from the Education Ministry of China (No. 625010112) and the National Natural Science Foundation of China (No. 51372030).
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Wu, Z., Zhu, J. & Liu, X. Improved fatigue property of hafnium substitute lead zirconate titanate deposited by pulse laser deposition. J Mater Sci: Mater Electron 28, 1819–1823 (2017). https://doi.org/10.1007/s10854-016-5731-7
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DOI: https://doi.org/10.1007/s10854-016-5731-7