Abstract
The fabrication of planar Al/ZnO/Si heterojunction photodetectors has received considerable attention. The crystalline quality of ZnO plays an important role in the properties of the fabricated device. In this study, ZnO micro-rods were grown on Si (100) without any catalysts using atmospheric pressure chemical vapor deposition, and were characterized to determine their potential for application in highly photosensitive ZnO/Si photodetectors. The ZnO rods were grown with various diameters and had a wurtzite structure oriented in the (002) plane. The effect of the substrate temperature on the crystalline structure was studied in the range of 450–750 °C. The planar structure of the Al/ZnO heterojunction photodetector indicated that the device is highly sensitive to ultraviolet and visible light. The photoresponse of the fabricated Al/ZnO device had a peak at 360 nm. The responsivity of the device reached 0.03 at a bias voltage of 1 V and reached 0.085 at a bias voltage of 5 V. The responsivity increased to 0.121 as the bias voltage increased to 10 V. The quantum efficiency of the device was 11, 32, and 42 % at bias voltages of 1, 5, and 10 V, respectively.
Similar content being viewed by others
References
M. Chen, Z.L. Pei, C. Sun, J. Gong, R.F. Huang, L.S. Wen, Mater. Sci. Eng. B 85, 212 (2001)
J. Herero, M.T. Gutierrez, C. Guillen, J.M. Dona, M.A. Martinez, A.M. Chaparro, Thin Solid Films 361–362, 28 (2000)
V. Srikant, D.R. Clarke, J. Appl. Phys. 83, 5447 (1998)
H. Kim, J.Y. Moon, H.S. Lee, Curr. Appl. Phys. 12, S35 (2012)
L.S. Chuah, Z. Hassan, S.S. Tneh, H. Abu Hassan, Compos. Interfaces 17(8), 733 (2010)
H. Hou, Y. Xie, Q. Li, Solid State Sci. 7(1), 45 (2005)
A.K. Zak, M.E. Abrishami, W.H. Abd Majid, Ceram. Int. 37, 393 (2011)
H.D. Um, S. Abdul Moiz, K.T. Park, J.Y. Jung, S.W. Jee, C.H. Ahn, D.W. Kim, H.K. Cho, D.W. Kim, J.H. Lee, Appl. Phys. Lett. 98, 033102 (2011)
S.W. Kim, S. Fujita, Appl. Phys. Lett. 81, 5036 (2002)
X.W. Sun, H.S. Kwok, J. Appl. Phys. 86, 408 (1999)
J.S. Liu, C.X. Shan, H. Shen, B.H. Li, Z.Z. Zhang, L. Liu, L.G. Zhang, D.Z. Shen, Appl. Phys. Lett. 101, 011106 (2012)
S.K. Panda, C. Jacob, Solid State Electron. 73, 44 (2012)
J.G. Lu, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, S. Fujita, J. Cryst. Growth 299, 1 (2007)
N. Takahashi, K. Kaiya, K. Omichi, T. Nakamura, S. Okamoto, H. Yamamoto, J. Cryst. Growth 209, 822 (2000)
T. Terasako, S. Shirakata, Jpn. J. Appl. Phys. 44, 1410 (2005)
K.T. Roro, J.K. Dangbegnon, S. Sivaraya, A.W.R. Leitch, J.R. Botha, J. Appl. Phys. 103, 053516 (2008)
T. Singh, D.K. Pandya, R. Singh, J. Nano- Electron. Phys. 3(1), 146 (2011)
T. Ohshima, R.K. Thareja, T. Ikegami, K. Ebihara, Surf. Coat. Technol. 169, 517 (2003)
T.K.S. Naidu, B. Srinivasulu, S. Uthanna, Cryst. Res. Technol. 35(10), 1193 (2000)
S.W. Rhee, H.W. Choi, Trans. Electr. Electron. Mater. 14(2), 86 (2013)
Z.R. Khan, M.S. Khan, M. Zulfequar, M.S. Khan, Mater. Sci. Appl. 4, 340 (2011)
V.V.S. Kumar, F. Singh, S. Ojha, D. Kanjilal, Adv. Mater. Lett. 4(5), 343 (2013)
R. Sing, M. Kumar, S. Chandra, J. Mater. Sci. 42(12), 4675 (2007)
A. Drici, G. Djeteli, G. Tchangbedji, H. Derouiche, K. Jondo, K. Napo, J.C. Berne`de, S. Ouro-Djobo, M. Gbagba, Physica Status Solidi (a) 201(7), 1528 (2004)
Z. Bai, X. Yan, X. Chen, H. Liu, Y. Shen, Y. Zhang, Curr. Appl. Phys. 13, 165 (2013)
Z. Bai, X. Yan, X. Chen, Y. Cui, P. Lin, Y. Shen, Y. Zhang, RSC Adv. 3, 17682 (2013)
T. Yen, J. Yun, S.J. Kim, Electrochem. Solid-State Lett. 14, H415 (2011)
G.M. Ali, P. Chakrabarti, J. Phys. D Appl. Phys. 43, 415103 (2010)
H.I. Abdulgafour, Z. Hassan, N.M. Ahmed, F.K. Yam, J. Appl. Phys. 112, 074510 (2012)
M. Rajabi, R.S. Dariani, A. IrajiZad, Sens. Actuators A 180, 11 (2012)
S.J. Young, L.W. Ji, S.J. Changa, Y.K. Su, J. Cryst. Growth 293, 43 (2006)
G.M. Ali, P. Chakrabarti, J. Phys. D Appl. Phys. 43(41), 415103 (2010)
Acknowledgments
The authors gratefully acknowledge the support from Department of Physics, College of Science at the University of Slahaddin. The authors are also grateful to Dr. Naser M. Ahmed Al-rawi for assistance with the FESEM, EDX, and XRD measurements.
Conflict of interest
The authors declare that they have no conflict of interest.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Hassan, Y.M., Kakil, S.A. Planar microcrystalline ZnO/Si heterojunction photodetector with Al electrodes. J Mater Sci: Mater Electron 26, 6092–6098 (2015). https://doi.org/10.1007/s10854-015-3187-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-015-3187-9