Abstract
Based on Hartmann-Shack sensor technique, an online thin film stress measuring system was introduced to measure the film stresses of TiO2 and SiO2, and comparison was made between the film stresses prepared respectively by the conventional process and the ion-beam assisted deposition. The effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 was investigated in details, and the stress control methodologies using on-line adjustment and film doping were put forward. The results show that the film stress value of TiO2 prepared by ion-beam assisted deposition is 40 MPa lower than that prepared by conventional process, and the stress of TiO2 film changes gradually from tensile stress into compressive stress with increasing ion energy; while the film stress of SiO2 is a tensile stress under ion-beam assisted deposition because of the ion-beam sputtering effect, and the film refractive index decreases with increasing ion energy. A dynamic film stress control can be achieved through in-situ adjustment of the processing parameters based on the online film stress measuring technique, and the intrinsic stress of film can be effectively changed through film doping.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Gu, P. F.: Thin Films Technology. Zhejiang University Press, Hangzhou (1990) (in Chinese)
Alfons, Z., Rainer, G., Matl, K.: Plasma ion assisted deposition: Investigation of film stress. Proc. SPIE 2776, 207–211 (1996)
Petar, V.: Mechanical stresses in oxide thin films. Vacuum 43, 727–729 (1992)
Shao, S. Y., Fan, Z. X.: Evolutions of residual stress and microstructure in ZrO2 thin films deposited at different temperature and rates. Thin Solid Films 445, 59–62 (2003)
Anthnoy, E. E.: Stress developed in optical film coatings. Applied Optics 5, 51–61 (1966)
Michael, L. F.: Application of ion-assisted deposition using a grid-less end-Hall ion source for volume manufacturing of thin film optical filters. Proc. SPIE 2253, 374–393 (1994)
Hansjoerg, S. N., N. K., Uwe, B. S., et al.: IAD of oxide coatings at low temperature: A comparison of process based on different ion sources. Proc. SPIE 3133, 205–213 (1997)
Stoney, G. G.: The tension of thin metallic film deposited by electrolysis. Proc. of the Royal Society of London 82, 172–180 (1909)
Malhotra, S. G., Rek, Z. U., Yalisove, S. M., et al.: Analysis of thin film stress measurement techniques. Thin Solid Film 301, 45–54 (1997)
Wen, Z., Cao, X. J.: Current status of research on measurement of the stress in thin film. Machinery Manufacturing Engineer 4 127–129 (2005) (in Chinese)
Shen, Y. M., Zhu, M. P., Shao, S. Y.: A high precision thin film stress on-line measurement structure and measuring method. 36, 412–415 (2007) (in Chinese)
Chen, K. S., Chen, T. Y. F., Chuang, C. C., et al.: Full-field wafer lever thin film stress measurement by phase-stepping shadow moire. IEEE Transactions on Components and Packaging Technologies 27, 594–603 (2004)
Bicker, M., Von Hülsen, U., Laudahn, U., et al.: Optical deflection stress measurements in thin films. Review of Scientific Instruments 69, 460–462 (1998)
Lin, X. C., Guo, Y. Y., Hu, Z. M., et al.: A kind of thin-film stress sensor based on beam-focusing multi-beam array. Chin. J. Semi. 25, 1491–1494 (2004) (in Chinese)
Manning, A. S., Fuchs, S.: Finite element analysis of thermal stresses in high-power substrates for hybrid circuits. Materials & Design 18, 61–72 (1997)
Callioǧlu, H., Bektag, N. B., Sayer, M.: Stress analysis of functionally graded rotating discs: Analytical and numerical solutions. Acta Mechanica Sinica 27, 950–955 (2011)
Li, Y. Q., Yu, Z. N., Wang, H. Q., et al.: Effects of substrate materials and deposition parameters on film stress. Acta Optica Sinica 30, 602–608 (2010) (in Chinese)
Cheng, K. J., Cheng, S. Y., et al.: Analysis and computation of the internal stress in thin films. Progress in Natural Science 8, 679–689 (1998)
Cheng, S. Y., Cheng, K. J.: Computation on heat of formation and EOS of alloy by are fined TFI model. Acta Phys. Sin. (Oversea Edition) 2, 439 (1993)
Wang, R. N., Liu, J. F.: The study of the effect of C+ ion injection on the film stress of CoSi2. Progress in Natural Science 12, 1296–1300 (2002) (in Chinese)
Cheng, Y. M., Tang, J. F., Gu, P. F.: Measurement and analysis of properties of films doped with oxides. Acta Optica Sinica 6, 70–75 (1986) (in Chinese)
Pulker, H. K.: Characterization of optical thin films. Thin Solid Films 18, 1969–1977 (1979)
Zhang, G. B., Hao, Y. L., Tian, D. Y., et al.: Study on characteristics of poly-silicon film stresses. Chinese Journal of Semiconductors 20, 463–467 (1999) (in Chinese)
Li, R. B.: Study of the stress in doped CVD diamond films. Acta Physica Sinica 56, 3429–3434 (2007) (in Chinese)
Ma, B. X., Yao, N., Jia, Y., et al.: Influence of structure on adhesion of grains in CVD diamond films. Acta Physica Sinica 54, 2854–2858 (2005) (in Chinese)
Luo, Y. H., Liu, C. H., Wang, W. Y.: Titanium Compounds. Metallurgical Industry Press, Beijing (2011) (in Chinese)
Ceniga, L.: Thermal stresses in two- and three- component anisotropic materials. Acta Mechanica Sinica 26, 695–709, 2010
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Li, YQ., Wang, HQ., Wang, WY. et al. Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control. Acta Mech Sin 28, 1382–1388 (2012). https://doi.org/10.1007/s10409-012-0146-z
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10409-012-0146-z