Abstract
Annealed thin layers of gold with large mono-crystalline areas were treated with OH· radicals generated in an electrochemical Fenton reaction. The morphological changes observed with ex situ atomic force microscopy in non-contact mode and grazing incidence X-ray diffractometry show that the grain boundaries, and generally the non-{111} planes, are the loci of highest reactivity, i.e., the places where the gold dissolution is much faster than on the {111} planes.
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Acknowledgments
The authors are very thankful to Professor Stephen Fletcher, Loughborough University, UK, for a detailed discussion of the results and especially for raising the question of line tension. F.S. and U.H. acknowledge the funding of the AFM instrumentation by the European Regional Development Fund (EFRE). G.S. acknowledges support by a fellowship of the Alfried Krupp Wissenschaftskolleg Greifswald. D.D. acknowledges support by CAPES Brazil and DAAD.
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Dedicated to Dr. Nina Fjodorovna Zakharchuk on the occasion of her 75th birthday.
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Hasse, U., Fricke, K., Dias, D. et al. Grain boundary corrosion of the surface of annealed thin layers of gold by OH· radicals. J Solid State Electrochem 16, 2383–2389 (2012). https://doi.org/10.1007/s10008-012-1756-x
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DOI: https://doi.org/10.1007/s10008-012-1756-x