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Application of photo-etching of polytetrafluoroethylene induced by high energy synchrotron radiation to LIGA

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Abstract

Polytetrafluoroethylene (PTFE) microstructures’ processing characteristics using X-ray photo decomposition and desorption are studied in the highest energy region (2–12 keV). While the exposed surface states are seen melting and boiling from the remaining bubble structure of the irradiated surface, basic photochemistry of PTFE is also same as previous reports. Surface modification of PTFE from hydrophobic to hydrophilic was investigated in order to bond PTFE sheets to a brass substrate. Then, we have a successfully fabricated Ni microstructure by LIGA process using PTFE photo-etching using high energy X-ray. Proposed LIGA using SR-photo-etching of PTFE can simplify the total process, and it can ensure that dimensional errors remain small due to swelling in developer and electroplating bath.

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Authors and Affiliations

  1. Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo, 3-1-2 Koto Kamigori, Ako-gun, Hyogo, 678-1205, Japan

    Hideki Kido & Yuichi Utsumi

  2. Graduate School of Engineering, Osaka Prefecture University, 3-1-2 Koto Kamigori, Ako-gun, Hyogo, 678-1205, Japan

    Tomoyuki Kuroki & Masaaki Okubo

Authors
  1. Hideki Kido
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  2. Tomoyuki Kuroki
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  3. Masaaki Okubo
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  4. Yuichi Utsumi
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Correspondence to Hideki Kido.

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Kido, H., Kuroki, T., Okubo, M. et al. Application of photo-etching of polytetrafluoroethylene induced by high energy synchrotron radiation to LIGA. Microsyst Technol 19, 301–307 (2013). https://doi.org/10.1007/s00542-012-1472-6

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  • DOI: https://doi.org/10.1007/s00542-012-1472-6

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