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Self-assembled micelle and film surface of fluorine/silicon-containing triblock copolymer

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Abstract

The novel fluorine/silicon-containing triblock copolymers PFMA m -b-PMMA n -b-PMPS p are synthesized by poly(2,2,3,3,4,4,4,-hexafluorobutyl methacrylate)-Cl initiating methylmethacrylate (MMA) and 3-(trimethoxysilyl)propyl methacrylate (MPS). Their self-assembled micelles and the film surface are studied. The typical core-shell (CS) micelles self-assembled in tetrahydrofuran (THF), chloroform (CHCl3), and butanone (MEK) are proved to have PFMA-core/poly(3-(trimethyoxysilyl)propyl methacrylate) PMPS/poly methylmethacrylate (PMMA)-shell structure, but have different morphlogy as 200-nm spherical CS, 190-nm half-spherical layered CS, and 340-nm multicore CS in THF, CHCl3, and MEK, respectively. The results reveal that the migration of PFMA segments onto the film surface is strongly controlled by the micelle structures. Therefore, the film surface casted from micelles obtains low wettability (θ a = 105–120° and θ r = 102°–119°) and viscoelasticity (ΔDf = −0.03 to −0.31×10−6 Hz−1). The lowest water adsorption and viscoelastic surface is created by the spherical CS in THF, but the film casted from MEK and CHCl3 behave rather flexible surfaces. PFMA m -b-PMMA n -b-PMPS p gains high thermal stability (375 °C) and strong adhesion strength (≥54 N).

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Acknowledgments

This work has been financially supported by the National Basic Research Program of China (973 Program, No.2012CB720904), the National Natural Science Foundation of China (NSFC Grants Nos. 51373133 and 51073126), the State Administration of Cultural Heritage (No. 20110128), and the International Cooperation Project of Shaanxi Province (No. 2014KW11). The authors also wish to express their gratitude for the MOE Key Laboratory for Nonequilibrium Condensed Matter and Quantum Engineering of Xi’an Jiaotong University.

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Correspondence to Ling He.

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Pan, A., He, L., Zhang, T. et al. Self-assembled micelle and film surface of fluorine/silicon-containing triblock copolymer. Colloid Polym Sci 293, 2281–2290 (2015). https://doi.org/10.1007/s00396-015-3618-4

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  • DOI: https://doi.org/10.1007/s00396-015-3618-4

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