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Spectroscopic observation of ablation plasma generated with a laser-driven extreme ultraviolet light source

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Abstract

An extreme ultraviolet (EUV) light source (λ = 9–25 nm, 10 Hz) was developed to study EUV ablation physics and applications. The EUV source device including an elliptical total reflection mirror was optimized to provide EUV irradiance as high as 4.2 × 109 W/cm2 on ablation samples. Time-resolved spectroscopic observation of ablation plasma from a Si plate was conducted to derive electron temperature and density, and compared with those for laser-produced ablation at the same irradiance. Difference in ablation mechanism between two sources is discussed.

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Acknowledgments

This work was supported by JSPS Grant-in-Aid for Young Scientists (B) number 25800303, Grant-in-Aid for Scientific Research (B) number 22340172, and MEXT Project for Creation of Research Platforms and Sharing of Advanced Research Infrastructure” opening up a new photonics industry through high-intensity lasers”.

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Authors and Affiliations

  1. Institute of Laser Engineering, Osaka University, Yamadaoka 2-6, Suita, Osaka, 565-0871, Japan

    Masaya Masuda, Nozomi Tanaka, Kazuyoshi Hane, Shinsuke Fujioka & Hiroaki Nishimura

  2. Institute for Laser Technology, Yamadaoka 2-6, Suita, Osaka, 565-0871, Japan

    Atsushi Sunahara

Authors
  1. Masaya Masuda
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  2. Nozomi Tanaka
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  3. Kazuyoshi Hane
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  4. Atsushi Sunahara
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  5. Shinsuke Fujioka
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  6. Hiroaki Nishimura
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Correspondence to Masaya Masuda.

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Masuda, M., Tanaka, N., Hane, K. et al. Spectroscopic observation of ablation plasma generated with a laser-driven extreme ultraviolet light source. Appl. Phys. B 119, 421–425 (2015). https://doi.org/10.1007/s00340-015-6041-0

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  • DOI: https://doi.org/10.1007/s00340-015-6041-0

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