Abstract
Atomically flat and epitaxial thin films of the electronically phase-separated compound \((\hbox {La}_{0.5}\hbox {Pr}_{0.5})_{0.67}\hbox {Ca}_{0.33}\hbox {MnO}_{3}\) were grown on as-received and treated (110) \(\hbox {NdGaO}_{3}\) substrates by fine tuning of oxygen pressure during deposition. The optimal conditions were determined using surface morphology, transport, magnetization, and X-ray diffraction measurements. Optimal thin films show step flow growth mode and bulk-like physical properties compared to thin films grown in off-optimal oxygen pressures, viz. the highest maximum temperature coefficient of resistance, the highest peak resistivity temperature, and reduced coercive fields.
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Acknowledgments
This work was supported by NSF DMR-1410237. H.J. acknowledges financial support from the Research Fund Program of Research Institute for Basic Sciences, Pusan National University, Korea, 2014, Project No. RIBS-PNU-2014-304. The authors are grateful for discussion with H. N. Lee. X-ray diffraction was conducted at major analytical instrumentation center, University of Florida.
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Jeen, H., Javed, R. & Biswas, A. Growth of atomically flat thin films of the electronically phase-separated manganite (La0.5Pr0.5)0.67Ca0.33MnO3 . Appl. Phys. A 122, 35 (2016). https://doi.org/10.1007/s00339-015-9543-z
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DOI: https://doi.org/10.1007/s00339-015-9543-z