Abstract
In this work, we report the experimental results on the formation of porous silicon (PSi) monolayers by electrochemical etching using a formaldehyde based electrolyte. The results were compared with PSi monolayers obtained with the traditional electrolyte (HF:ethanol). Both electrolytes facilitate the removal of H2 generated as a subproduct during the electrochemical etching process in the surface of the c-Si substrate. Formaldehyde presents a good affinity to surfaces and interfaces and the excess of water in the electrolyte reduces the pore sizes of PSi samples. The porosity and etching rate values are similar than those obtained using HF:et solutions. The refractive index values are the same in both cases at the same porosity in the visible range. The results have shown that the chemical characteristics of the ethanol and formaldehyde can give some different advantages to the PSi process and its applications.
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Acknowledgements
This work was partially supported by VD-BUAP/PIFI funds provided through the CA: Física Aplicada. M.E.C. wants to acknowledge to CONACYT for the financial support under Grant No. 167993. The authors want to acknowledge the assistance of Dr. Victor Rejón (CINVESTAV-Merida) for HRSEM images.
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De La Luz Merino, S., Morales-Morales, F., Méndez-Blas, A. et al. Applications of porous silicon formed by electrochemical etching using an electrolyte based on HF:formaldehyde. Appl. Phys. A 111, 1077–1083 (2013). https://doi.org/10.1007/s00339-012-7529-7
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DOI: https://doi.org/10.1007/s00339-012-7529-7