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Formation of copper nanoscale particles in implanted silica glass

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Science and Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, 466, Nagoya, Japan

    H. Hosono, Y. Ikuhara, Y. Abe & R. A. Weeks

  2. Japan Fine Ceramics Center, Rokuno-cho, Atsuta-ku, 456, Nagoya, Japan

    Y. Ikuhara

  3. Department of Materials Science and Engineering, Vanderbilt University, 37235, Nashville, TN, USA

    R. A. Weeks

Authors
  1. H. Hosono
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  2. Y. Ikuhara
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  3. Y. Abe
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  4. R. A. Weeks
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Hosono, H., Ikuhara, Y., Abe, Y. et al. Formation of copper nanoscale particles in implanted silica glass. J Mater Sci Lett 11, 1257–1259 (1992). https://doi.org/10.1007/BF00729784

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  • DOI: https://doi.org/10.1007/BF00729784

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