Abstract
Corrosion of copper in HClO4 solution containing various concentrations (10−7–10−4 M) of benzoic acid,p-toluic acid,p-nitrobenzoic acid, phthalic acid and terephthalic acid has been studied at 30° C. These compounds inhibit corrosion effectively even in trace concentration. The corrosion rate is a function of temperature, concentration and nature of the inhibitor. The inhibitor efficiency calculated from weight loss and polarization methods are in good agreement. Thermodynamic parameters for adsorption of inhibitors have been evaluated by using the Bockris-Swinkels adsorption isotherm withn=5 as the configurational function. The corrosion inhibition is discussed from a view point of adsorption of inhibitor molecules at the metal-solution interface.
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Dinnappa, R.K., Mayanna, S.M. Benzoic acid and substituted benzoic acids as interfacial corrosion inhibitors for copper in HClO4 . J Appl Electrochem 11, 111–116 (1981). https://doi.org/10.1007/BF00615329
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DOI: https://doi.org/10.1007/BF00615329