Abstract
Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.
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References
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Matsuyama, T., Ujike, T. Orthogonal Aberration Functions for Microlithographic Optics. OPT REV 11, 199–207 (2004). https://doi.org/10.1007/s10043-004-0199-8
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DOI: https://doi.org/10.1007/s10043-004-0199-8